Blank masks are a core material in semiconductor and display photolithography, and S&S Tech is the sole domestic producer of this material.
In the DUV (ArF/KrF) segment, the company's technology enables single patterning down to a minimum of 38 nanometers and multi-patterning down to 7 nanometers, supplying both domestic and overseas foundries. China in particular is expanding capacity focused on mature nodes, driving blank mask demand higher.
According to semiconductor industry association SEMI, China's chip production capacity is expected to grow 15% this year and 14% next year, and in this process Chinese firms have reportedly been actively purchasing blank masks from Korean suppliers, with some blank mask prices showing signs of significant increase in the second half of this year.
The EUV blank mask market remains at an early stage but is growing quickly; the global EUV blank mask market, valued at roughly $300 million this year, is projected to reach $1.3 billion by 2035, a 16.5% compound annual growth rate.
That market, however, has been heavily dependent on Japan, with HOYA and Asahi Glass having captured most of Samsung's volume as Japanese firms with more advanced materials technology have led supply.
Samsung Electronics currently imports most of its EUV blank masks from HOYA, but has faced procurement difficulties in the past due to issues such as earthquakes in Japan, prompting it to seek supply-chain diversification.
This presents S&S Tech with an entry opportunity as a challenger, while also requiring the company, as a newer entrant with a shorter verification and production track record, to build a reliable supply record.